Key Features

• In-Situ Mask Exchange System: * Allows users to switch shadow masks without breaking the vacuum.

  • Minimizes contamination and significantly reduces process downtime, ensuring the integrity of sensitive organic layers.

• Adjustable Source-to-Substrate Distance:

  • Optimized for electrode deposition by allowing the substrate to move closer to the thermal source.

  • Maximizes deposition rates and material utilization efficiency for metallic sources.

• High-Uniformity Rotation Stage:

  • The substrate holder features continuous rotation during deposition.

  • Ensures excellent film thickness uniformity across large-area substrates.

• Multi-Source Versatility: * Equipped with multiple evaporation sources (Low-Temperature Cells for organics and Boat/Filament sources for metals).

• Precise co-deposition and sequential layer growth capabilities.