| Low-Temperature Operation: Designed for materials with low melting points to prevent overheating and premature evaporation.High-Vacuum Environment (HV/UHV): Maintains high vacuum to minimize impurities, as indium easily oxidizes and acts as a getter.Cryogenic-Compatible Deposition: Produces high-purity, low-stress, and stable thin films suitable for quantum computing applications.Controlled Film Thickness: Provides high-precision thickness control for nanometer-scale junctions.Suppression of "Overspray": Features specialized shielding to prevent indium (which has a tendency to stick to surfaces) from coating the chamber walls.
Evaporation Source (Source Heater): Uses a resistive boat or basket made of Tungsten (W) or Molybdenum (Mo).Crucible Liners: Alumina, Graphite 
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